@article {18814,
	title = {An extraction-based verification methodology for MEMS},
	journal = {Microelectromechanical Systems, Journal of},
	volume = {11},
	year = {2002},
	month = {2002/02//},
	pages = {2 - 11},
	abstract = {Micromachining techniques are being increasingly used to develop miniaturized sensor and actuator systems. These system designs tend to be captured as layout, requiring extraction of the equivalent microelectromechanical circuit as a necessary step for design verification. This paper presents an extraction methodology to (re-)construct a circuit schematic representation from the layout, enabling the designer to use microelectromechanical circuit simulators to verify the functional behavior of the layout. This methodology uses a canonical representation of the given layout on which feature-based and graph-based recognition algorithms are applied to generate the equivalent extracted schematic. Extraction can be performed to either the atomic level or the functional level representation of the reconstructed circuit. The choice of level in hierarchy is governed by the trade off between simulation time and simulation accuracy of the extracted circuit. The combination of the MEMS layout extraction and lumped-parameter circuit simulation provides MEMS designers with VLSI-like tools enabling faster design cycles, and improved design productivity},
	keywords = {atomic level, canonical representation, circuit schematic representation, circuit simulation, design cycles, design productivity, design verification, digital simulation, equivalent circuits, equivalent microelectromechanical circuit, extraction-based verification methodology, feature-based recognition algorithms, functional behavior, functional level, graph-based recognition algorithms, layout extraction, lumped parameter networks, lumped-parameter circuit simulation, MEMS, microelectromechanical circuit simulators, micromachining techniques, micromechanical devices, simulation accuracy, simulation time},
	isbn = {1057-7157},
	doi = {10.1109/84.982857},
	author = {Baidya,B. and Gupta,S.K. and Mukherjee,T.}
}
@article {18862,
	title = {Nano-to-millimeter scale integrated systems},
	journal = {Components and Packaging Technologies, IEEE Transactions on},
	volume = {22},
	year = {1999},
	month = {1999/06//},
	pages = {338 - 343},
	abstract = {Over the last several years various industries have been developing nano, micro, and millimeter scale technologies, which have resulted in components ranging from quantum transistors, to widely commercialized integrated circuits, to microelectromechanical sensors. A common emphasis of these fabrication industries has been on the integration of different functions in miniaturized systems; however, the technology currently used to realize these systems is monolithic. A unique class of hybrid technology systems is Integrated nano to millimeter (In2m) systems. An In2m system typically has components spanning multiple sizes, diverse technology domains, and mixtures of electrical, mechanical, thermal, chemical, fluidic, and biological functions},
	keywords = {fabrication technology, In2m, integrated nano to millimeter system, micromechanical devices, nanotechnology},
	isbn = {1521-3331},
	doi = {10.1109/6144.774758},
	author = {Last,H.R. and Deeds,M. and Garvick,D. and Kavetsky,R. and Sandborn,P. A. and Magrab,E. B. and Gupta,S.K.}
}
